By Nidhi DhullMay 10 2024Reviewed by Lexie Corner Nanoimprint lithography is a rapid, high-resolution nanopatterning method that meets industrial requirements with its high throughput and low cost. Its capability for easy, large-area production of nanoscale structures makes it suitable for various applications, including nanotechnology, microsystems, electronics, optical devices, and healthcare.
Nanostructure Patterning for Nanotechnology and Microsystems NIL has established its ability to create almost sub-nm range features precisely and accurately. It is effectively used for nanostructure patterning various materials for nano- and microsystems. For instance, it has been recently used to produce flexible graphene micro-supercapacitors, nanoribbons, biomaterials, and other functional materials.
As NIL-based fabrication covers the visible wavelength range, it is employed to manufacture various optical components and devices, such as polarizers, anti-reflectors, and micro-lenses. Displays with high resolution, thin panels, and low power consumption can also be manufactured on a large scale using NIL.
Recent Advances and Industrial Applications With improvements in throughput, alignment, defectivity, and mask replication, NIL methods are being applied in novel industrial applications. For instance, a recent article in Nanomanufacturing reviewed the use of NIL to produce biomimetic nanostructures, which find diverse applications in optics to life sciences.
Future Directions and Emerging Trends Micro- and nanostructure fabrication using NIL can support several new technologies.2 Three-dimensional QR codes developed using NIL can feature pillars of varying pitches, generate areas of different reflectivity, and improve product identification, traceability, and security.1
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